Angela Lee
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- October 11, 2025
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Exploring Next-Gen Lithography via National Lab Collaborations with Erik Hosler
Lithography has always been the defining bottleneck of semiconductor progress. Each new node demands more precise light sources, optics, and inspection tools, pushing the limits of physics and engineering. Today, Extreme Ultraviolet (EUV) lithography supports the most advanced chips, but sustaining progress will require breakthroughs in power scaling, defect control, … Read the rest
